发明名称 |
PHOTORESIST COMPOSITION FOR IMAGING THICK FILMS |
摘要 |
The present invention provides for a light-sensitive photoresist composition useful for imaging thick films, comprising a polymer which is insoluble in an aqueous alkali developer but becomes soluble prior to development, a photoacid generator which produces a strong acid upon irradiation and a photobleachable dye. The invention further provides for a process for imaging the photoresist of the present invention, especially where the thickness of the photoresist is up to 200 microns (µm) and where the process comprises a single exposure step. |
申请公布号 |
WO2007007176(A2) |
申请公布日期 |
2007.01.18 |
申请号 |
WO2006IB01933 |
申请日期 |
2006.07.07 |
申请人 |
AZ ELECTRONIC MATERIALS USA CORP. |
发明人 |
TOUKHY, MEDHAT, A.;LU, PING-HUNG;MULLEN, SALEM, K. |
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