METHOD FOR CLEANING PHOTOMASK FOR COLOR FILTER

摘要

PROBLEM TO BE SOLVED: To provide a method for cleaning a photomask for avoiding occurrence of pattern defects and patterns beside specification caused by foreign matter or contamination of a photomask and for decreasing the frequency of exchanging photomasks in a process of forming a pattern constituting a color filter by exposure and development of a photoresist coating film through a photomask.

SOLUTION: A photomask for a color filter is cleaned in a wet state using an alkali cleaning liquid and then cleaned with light by using UV rays. The main wavelength of the UV rays is 165 to 175 nm.

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