| 发明名称 |
CATADIOPTRIC PROJECTION OBJECTIVE WITH ADAPTIVE MIRROR AND PROJECTION EXPOSURE METHOD |
| 摘要 |
A catadioptric projection objective for microlithography has at least one curved mirror that is deformable and adjusting elements that can deform the deformable mirror. The adjusting elements are matched to given image errors and their correction. The invention is suitable for astigmatism, fourfold wavefront-deformations due to lens heating, compaction, and the like.
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| 申请公布号 |
US2007012871(A1) |
申请公布日期 |
2007.01.18 |
| 申请号 |
US20060533632 |
申请日期 |
2006.09.20 |
| 申请人 |
WAGNER CHRISTIAN;GERHARD MICHAEL;RICHTER GERALD |
发明人 |
WAGNER CHRISTIAN;GERHARD MICHAEL;RICHTER GERALD |
| 分类号 |
H01J3/14;G02B17/08;G02B26/08;G02B27/00;G03F7/20 |
主分类号 |
H01J3/14 |
| 代理机构 |
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| 主权项 |
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