| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus capable of suppressing the conveyance of contaminants, stray light, temperature gradients and/or the effect of air bubbles on imaging quality; and to provide a method of manufacturing a device. <P>SOLUTION: There is disclosed an immersion lithographic apparatus supplying a liquid to a space between a projection system and a substrate, and provided with a plate structure for dividing the space into two parts. The plate structure has an opening for permitting the transmission of projection beams, a through-hole for suppressing a damping effect due to the existence of the plate, and optionally one or a plurality of inlets and outlets for providing various flows to the circumference of the opening of the plate. <P>COPYRIGHT: (C)2007,JPO&INPIT |
