| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic device with which various sizes of substrates including nonstandard substrates can be processed without making a major change for the lithographic device which is so designed as to hold and process specific sizes and forms of substrates. <P>SOLUTION: The lithographic device comprises: a substrate table which is so constituted as to hold a first type of first substrate, wherein the first substrate has a polishing surface; and a projection system which is so constituted as to project a radiation beam, provided with a pattern, to a target part of the substrate. The polishing surface supports a second type of second substrate, and the projection system is so constituted as to project the radiation beam, provided with the pattern, to the second substrate. <P>COPYRIGHT: (C)2007,JPO&INPIT |
