| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of an IZO sputtering target which makes it possible to improve the productivity and reduce the cost by curtailing the processes and lowering the sintering temperature while maintaining the characteristics as an IZO sputtering target. <P>SOLUTION: The manufacturing method of the IZO sputtering target is characterised by including a mixing and pulverizing process for obtaining a fine powder by mixing and pulverizing an indium oxide powder and a zinc oxide powder having specified properties or a raw material powder containing these powders as main components, a molding process for obtaining a molding by molding the above-mentioned fine powder, and a sintering process for obtaining a sintered body by sintering the above-mentioned molding under pressure and in an oxygen atmosphere at a temperature of 1,100-1,250°C. <P>COPYRIGHT: (C)2007,JPO&INPIT |
