| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum vapor deposition apparatus which is preferably used, for instance, for oblique-depositing an inorganic oriented film for an electro-optical device such as a liquid crystal device, and improves productivity. SOLUTION: The vacuum vapor deposition apparatus 10 comprises a target chamber 100, a process chamber 200 and a flight chamber 300. Each chamber is composed so as to be capable of independently keeping vacuum. The flight chamber 300 is composed so as to be removable from the vacuum vapor deposition apparatus 10 while a space 101 in the target chamber 100 and a space 201 in the process chamber 200 are each kept into a vacuum state. The flight chamber 300 is also composed of first to third flight chambers, and each of them is also composed so as to be removable from others. COPYRIGHT: (C)2007,JPO&INPIT
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