发明名称 High-density logic techniques with reduced-stack multi-gate field effect transistors
摘要 Techniques for employing multi-gate field effect transistors (FETS) in logic circuits formed from logic gates are provided. Double-gate transistors that conduct only when both transistor gates are active can be used to reduce the number of devices hitherto required in series or "stacked" portions of logic gates. Circuit area can be reduced and performance can be enhanced.
申请公布号 US2007013413(A1) 申请公布日期 2007.01.18
申请号 US20050181954 申请日期 2005.07.14
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CHIANG MENG-HSUEH;CHUANG CHING-TE K.;KIM KEUNWOO
分类号 H03K19/20 主分类号 H03K19/20
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