发明名称 Semiconductor device and method for manufacturing semiconductor device
摘要 The present invention is to provide a semiconductor device including: a semiconductor layer that has a first-conductivity-type region, a second-conductivity-type region, a first-conductivity-type region, and a second-conductivity-type region that are adjacent to each other in that order; first and second electrodes that are connected to the first-conductivity-type region and the second-conductivity-type region, respectively, at both ends of the semiconductor layer; and a gate electrode that is coupled to the second-conductivity-type region or the first-conductivity-type region in an intermediate area of the semiconductor layer, the gate electrode being provided over a plurality of faces of a semiconductor layer portion serving as the second-conductivity-type region or the first-conductivity-type region in the intermediate area.
申请公布号 US2007012945(A1) 申请公布日期 2007.01.18
申请号 US20060482693 申请日期 2006.07.10
申请人 SONY CORPORATION 发明人 SUGIZAKI TARO
分类号 H01L29/74;H01L21/332 主分类号 H01L29/74
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