| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an apparatus for cleaning capable of improving the unevenness of a cleaning process by restraining a gas from resolving into a chemical stored in a chemical vessel. <P>SOLUTION: The apparatus for cleaning comprising a cleaning vessel 2 in which a process liquid using for cleaning a cleaning object is stored, a holding mechanism 4 for holding the cleaning object W in the cleaning vessel 2, a process liquid supplying mechanism 3 for supplying the process liquid into the cleaning vessel 2 wherein the cleaning object W is immersed in the process liquid in the cleaning vessel 2 and the cleaning object is cleaned while the process liquid overflows the cleaning vessel 2 further comprises a cover 10 which covers the liquid surface of the cleaning vessel 2, supporting members 15a, 15b which support the cover 10, and following mechanisms 14a, 14b which transfer the cover 10 following along the liquid surface as it remains supported by the supporting members 15a, 15b. <P>COPYRIGHT: (C)2007,JPO&INPIT |
