发明名称 |
RESIN ETCHING LIQUID, METHOD FOR ETCHING RESIN, METHOD FOR RELEASING RESIN AND METHOD FOR PRODUCING FLEXIBLE PRINTED WIRING BOARD |
摘要 |
PROBLEM TO BE SOLVED: To provide an etching liquid of a polyimide resin having excellent shape reproducibility of a hole of even a through-hole and a blind via hole having≤100μm size, affording a microscopically viewed smooth hole wall and having a long life, to provide a method for etching a polyimide film using a photosensitive resin film carrying out an alkali development treatment as a resist, to provide a method for forming a cover lay composed of the polyimide resin in a high-accuracy and high-definition pattern form using a negative type photosensitive resin film and to provide a method for releasing the polyimide resin. SOLUTION: The etching liquid of the polyimide resin is characterized as comprising an aqueous solution containing 10-40 mass% of N-(β-aminoethyl)ethanolamine and 20-40 mass% of potassium hydroxide. The method for etching, method for forming the cover lay and method for releasing the resin comprise using the etching liquid. COPYRIGHT: (C)2007,JPO&INPIT
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申请公布号 |
JP2007008969(A) |
申请公布日期 |
2007.01.18 |
申请号 |
JP20050176088 |
申请日期 |
2005.06.16 |
申请人 |
MITSUBISHI PAPER MILLS LTD |
发明人 |
NAKAGAWA KUNIHIRO;TOYODA YUJI |
分类号 |
C09K13/02;H05K3/00;H05K3/28 |
主分类号 |
C09K13/02 |
代理机构 |
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