发明名称 Method of monitoring a semiconductor manufacturing trend
摘要 A parametric parameter is selected, which has an upper specification limit and a lower specification limit. A storage percentile is determined. The storage percentile is equal to a product yield percentage if the number of the set of measurements greater than the upper specification limit exceeds the number of the set of measurements lower than the lower specification limit, and is equal to the product yield percentage subtracted from one hundred percent if the number of the set of measurements less than the lower specification limit exceeds the number of the set of measurements greater than the upper specification limit. A measurement closest to the storage percentile is stored.
申请公布号 US2007013398(A1) 申请公布日期 2007.01.18
申请号 US20060344664 申请日期 2006.02.01
申请人 RATHEI DIETER 发明人 RATHEI DIETER
分类号 G01R31/26 主分类号 G01R31/26
代理机构 代理人
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