| 摘要 |
PROBLEM TO BE SOLVED: To provide a technology for controlling occurrence of such matters as collapse of a cylinder, poor drying in a trench, and the like, caused by water remaining between fine patterns in substrate processing equipment. SOLUTION: In a gas dissolution section 44, rinse liquid rC dissolving carbon dioxide is produced by pressure dissolving carbon dioxide into pure water. A substrate W is immersed into the rinse liquid rC dissolving carbon dioxide stored in a processing tank 20 to clean the surface, and then the substrate W is pulled up into a chamber 10 under IPA gas atmosphere and dried. COPYRIGHT: (C)2007,JPO&INPIT
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