| 摘要 |
PROBLEM TO BE SOLVED: To provide an etching composition capable of etching each metal layer in each mask stage composed of aluminum, molybdenum, indium tin oxide or the like, and to provide a manufacturing method of an array substrate for a liquid crystal display device in simple stages that reduces manufacturing costs and increases productivity. SOLUTION: The etching composition may include a phosphoric acid of 40 to 70 wt%, a nitric acid of 3 to 15 wt%, an acetic acid of 5 to 35 wt%, a chlorine compound of 0.05 to 5 wt%, a chlorine stabilizer of 0.01 to 5 wt%, a pH stabilizer of 0.01 to 5 wt%, and water of residual quantity. In the manufacturing method of an array substrate for a liquid crystal display device, each metal layer is etched using the etching composition. COPYRIGHT: (C)2007,JPO&INPIT |
