发明名称 Method for exposing an object to light and exposure apparatus for performing the same
摘要 In a method for exposing an object to light and an exposure apparatus for performing the method, projection lights having image information may be produced. The projection lights may be projected onto the film on the substrate and travel along separately advancing paths. The advancing paths may not intersect with each other. To produce the projection light, illumination light beams proceeding along separately advancing paths may be produced. Thereafter, reticle patterns may transmit the illumination light beams. The reticle patterns may move in a first direction, and the substrate may move in a second direction opposite the first direction. The illumination light beams may be produced by separating an initial light. The projection lights may be projected onto the film at the same time or different times.
申请公布号 US2007013884(A1) 申请公布日期 2007.01.18
申请号 US20060482747 申请日期 2006.07.10
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM HAK
分类号 G03B27/42 主分类号 G03B27/42
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