| 摘要 |
<p>A substrate (P) has a back surface (Pb) which is supported by a substrate holder, and while being supported by the holder, a front surface (Pa) of the substrate is irradiated with an exposure light. In the back surface (Pb) of the substrate (P), a region (A3) facing the upper surface of a peripheral wall of the substrate holder is formed flat. Consequently, the region (A3) can closely adhere to the upper surface of the peripheral wall, thereby suppressing intrusion of water to the back surface side of the substrate.</p> |
