发明名称 EXPANDED THERMAL PLASMA APPARATUS
摘要 <p>Disclosed herein is an assembly for plasma generation comprising a cathode plate comprising a fixed cathode tip, the cathode tip being integral part of the cathode plate. The assembly further comprises at least one cascade plate, at least one separator plate disposed between the cathode plate and the cascade plate, an anode plate, and an inlet for a gas. The cathode plate, separator plate, cascade plate and anode plate are "electrically isolated" from one another, and the electrically isolated cathode plate, separator plate, and cascade plate define a plasma generation chamber. The cathode tip is disposed within the plasma generation chamber.</p>
申请公布号 WO2006012179(A3) 申请公布日期 2007.01.18
申请号 WO2005US22185 申请日期 2005.06.22
申请人 GENERAL ELECTRIC COMPANY;MIEBACH, THOMAS;IACOVANGELO, CHARLES, DOMINIC;MORRISON, WILLIAM, ARTHUR 发明人 MIEBACH, THOMAS;IACOVANGELO, CHARLES, DOMINIC;MORRISON, WILLIAM, ARTHUR
分类号 H05H1/34;C23C16/00 主分类号 H05H1/34
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