发明名称 Illumination apparatus exposure apparatus and device manufacturing method
摘要 <p>An illumination apparatus for illuminating a mask (200) having a pattern, using light from a light source (102), includes a generating section (140-152) for generating an effective light source distribution for a modified illumination to the mask, a polarization setting section (110) for setting a predetermined polarization state in plural areas in the effective light source distribution, and an adjusting section (160) for commonly controlling a polarization state of each area. </p>
申请公布号 EP1577709(A3) 申请公布日期 2007.01.17
申请号 EP20050251640 申请日期 2005.03.17
申请人 CANON KABUSHIKI KAISHA 发明人 TSUJI, TOSHIHIKO
分类号 G02B5/30;G03F7/20;G02B5/32;H01L21/027 主分类号 G02B5/30
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