发明名称 |
Laser irradiation apparatus, laser irradiation method, beam homogenizer, semiconductor device, and method of manufacturing the semiconductor device |
摘要 |
<p>A beam homogenizer configured for converting an originally rectangular beam into a linear shape having a two stage energy distribution in a width direction comprising a first beam width (w1) having a first energy density (E1) and a second beam width (w2) having a second energy density (E2), the beam homogenizer comprising: an optical lens (501) for dividing an incident laser beam in width direction into parts and enlarging the parts; and an optical system (204, 208) for synthesizing said parts of said laser beam divided by said optical lens in a width direction, whereby the synthesized laser beam has a two stage energy distribution in the width direction, wherein said optical lens (501) includes a plano-convex lens (602, 603, 604, 605) as a cylindrical lens and a plano-convex lens cut into halves (601, 606) perpendicular to its plane surface as a semi-cylindrical lens.</p> |
申请公布号 |
EP1744349(A2) |
申请公布日期 |
2007.01.17 |
申请号 |
EP20060014609 |
申请日期 |
1999.10.01 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
TANAKA, KOICHIRO |
分类号 |
B23K26/073;H01L21/20;B23K26/06;B23K26/067;G02B26/10;G02B27/09;G02B27/10;H01L21/268;H01L21/336 |
主分类号 |
B23K26/073 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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