| 摘要 |
A neutral beam etching device for separating and accelerating plasma is provided to facilitate an etching process by forming a horn-type chamber to focus a positive ion and an electron on the etching area. In a neutral beam etching device for separating and accelerating plasma, a first chamber(110) has a first opening on one side of the first chamber(110). A second chamber(120) has a second opening on one side of the second chamber(120), and is arranged inside the first chamber(110) to form a plasma creation area between the first chamber(110) and the second chamber(120). A first channel(130) connects the first opening to the plasma creation area. A second channel(140) connects the second opening to the plasma creation area. A coil(160) forms a certain-sized magnetic field to create plasma in the plasma creation area. An accelerator(170) discharges a positive ion and an electron of the plasma through the first channel(130) and the second channel(140) after separating the plasma into the positive ion and the electron and accelerating the positive ion and the electron.
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