发明名称 |
Method of treatment with a microwave plasma |
摘要 |
<p>Disclosed is a method of treatment with a microwave plasma by maintaining a reduced pressure in a plasma-treating chamber for treatment with a plasma in which a substrate that is to be treated with a microwave plasma is contained, introducing a treating gas into the plasma-treating chamber and introducing microwaves into the plasma-treating chamber, wherein a metallic antenna is disposed in the plasma-treating chamber. The plasma is generated within a very short period of time maintaining stability after the microwaves are introduced into the plasma-treating chamber, and the treatment is accomplished maintaining stability.
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申请公布号 |
EP1220281(A3) |
申请公布日期 |
2007.01.17 |
申请号 |
EP20010310873 |
申请日期 |
2001.12.24 |
申请人 |
TOYO SEIKAN KAISYA, LTD. |
发明人 |
NAMIKI, TSUNEHISA;IEKI, TOSHIHIDE;KOBAYASHI, AKIRA;YAMADA, KOJI;KURASHIMA, HIDEO |
分类号 |
H01J37/32;H05H1/46;B65D1/00;B65D1/09;C23C16/04;C23C16/26;C23C16/455;C23C16/511 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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