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发明名称
CHEMICAL VAPOR DEPOSITION FILM FORMED BY PLASMA CVD PROCESS AND METHOD FOR FORMING SAME
摘要
申请公布号
EP1630250(A4)
申请公布日期
2007.01.17
申请号
EP20040722715
申请日期
2004.03.23
申请人
TOYO SEIKAN KAISYA, LTD.
发明人
KOBAYASHI, AKIRA;NAMIKI, TSUNEHISA;HOSONO, HIROKO;KURASHIMA, HIDEO;INAGAKI, HAJIME;IEKI, TOSHIHIDE
分类号
C23C16/40;B65D1/00;C23C16/02;C23C16/04;C23C16/511;C23C16/515;H01J37/32
主分类号
C23C16/40
代理机构
代理人
主权项
地址
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