发明名称 |
FABRICATION METHOD OF ORIENTATION CONTROLLED SIMGLE-CRYSTALLINE WIRE AND TRANSISTOR ADOPTING THE WIRE |
摘要 |
A single crystalline with a controlled orientation is provided to fabricate high quality nano-wire and transistor on a substrate by forming nano-wire in parallel on a substrate while using a crystalline material like Si, SiGe and the like. A template layer is formed on a substrate(100) made of silicon or sapphire, including a first lateral surface and a second surface confronting the first lateral surface. Pores are formed between the first and the second lateral surfaces of the template layer, having a first opening in the first lateral surface. A single crystalline material layer comes in contact with the first opening formed in the first lateral surface of the template layer. After a second opening connected to the pore formed in the second lateral surface is formed, a crystalline growth material of gas state is supplied through the second opening to form a crystalline wire in the pore by crystalline growth from the single crystalline material layer. The crystalline wire is made of silicon or silicon germanium.
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申请公布号 |
KR20070008023(A) |
申请公布日期 |
2007.01.17 |
申请号 |
KR20050062923 |
申请日期 |
2005.07.12 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
WENXUXIANYU;PARK, YOUNG SOO;TAKASHINOGUCHI;CHOHANSSE YOUNG;ZHANGXIAOXIN;HUAXIANGYIN |
分类号 |
H01L21/335 |
主分类号 |
H01L21/335 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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