发明名称 FABRICATION METHOD OF ORIENTATION CONTROLLED SIMGLE-CRYSTALLINE WIRE AND TRANSISTOR ADOPTING THE WIRE
摘要 A single crystalline with a controlled orientation is provided to fabricate high quality nano-wire and transistor on a substrate by forming nano-wire in parallel on a substrate while using a crystalline material like Si, SiGe and the like. A template layer is formed on a substrate(100) made of silicon or sapphire, including a first lateral surface and a second surface confronting the first lateral surface. Pores are formed between the first and the second lateral surfaces of the template layer, having a first opening in the first lateral surface. A single crystalline material layer comes in contact with the first opening formed in the first lateral surface of the template layer. After a second opening connected to the pore formed in the second lateral surface is formed, a crystalline growth material of gas state is supplied through the second opening to form a crystalline wire in the pore by crystalline growth from the single crystalline material layer. The crystalline wire is made of silicon or silicon germanium.
申请公布号 KR20070008023(A) 申请公布日期 2007.01.17
申请号 KR20050062923 申请日期 2005.07.12
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 WENXUXIANYU;PARK, YOUNG SOO;TAKASHINOGUCHI;CHOHANSSE YOUNG;ZHANGXIAOXIN;HUAXIANGYIN
分类号 H01L21/335 主分类号 H01L21/335
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