METHOD, DEVICE AND SYSTEM FOR CONTROLLING DISSOLVED AMOUNT OF GAS

摘要

A method, a device, and a system for controlling the dissolving amount of gas are provided to produce the gas dissolved functional water for cleaning in a semiconductor producing process and to deaerate the harmful volatile gas. The device for controlling the dissolving amount of gas is composed of a pressure reducing unit(1A) making the inside of a tank(5) into a pressure reducing space by connecting a vacuum pump(1a) and a hole formed at the upper side of the closed tank through a pipe(1b); a spraying supply unit(1B) spraying a treated solution pressurized by a pressurizing pump(2) through a nozzle(3) with swirling up a great quantity of the peripheral gas from the inner upper part of the tank to the pressure reducing space; a vacuole generator(1C) generating a great quantity of bubbles by receiving the sprayed solution from the center of an opening of a container(4) and changing the bubbles into vacuoles; a recovery pump unit(1D) falling down the vacuoles flowing out from the upper end of the container, then temporarily storing the vacuoles as a deaerated treated solution, and recovering the treated solution; and a water level sensor(1E) of which a portion is installed in the tank to transmit information for keeping the level of the treated solution stored in the tank to a pump(7) and a valve(5b).