| 摘要 |
A method for synthesis of germanium nanoparticles in thin SiO2 films comprising: preparing a solution comprising silicon esters, germaniumtetrachloride (GeCl4) or germanium esters, methyl- or higher alcohols, and water; applying the solution to a surface of a substrate; consolidating the solution on the surface of the substrate, thereby obtaining a glass comprising silicon dioxide and germanium dioxide; selectively reducing the germanium dioxide to form germanium nanoparticles. |
