A universal method for selective area growth of organic molecular by vapour deposition

摘要

A method for selective growth of organic molecules on a substrate is proposed. The method comprises: creating a pattern of nucleation sites for the organic molecules on the substrate; depositing of organic molecules at the nucleation sites by vapor deposition. An organic material based device obtained by performing the method is also proposed. The method offers an alternative to methods that are known the fields of coating technology or semiconductor fabrication.