发明名称 |
Versatile maskless lithography system with multiple resolutions |
摘要 |
A versatile maskless patterning system with capability for selecting rapidly among a plurality of projection lenses mounted on a turret. This provides the ability to rapidly select multiple choices for resolution and enables optimization of the combination of the imaging resolution and exposure throughput, making possible cost-effective fabrication of microelectronics packaging products. A preferred embodiment uses a digital micromirror device array spatial light modulator as a virtual mask. Another preferred embodiment use multiple closely spaced digital micromirror device array spatial light modulators to enhance throughput.
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申请公布号 |
US7164465(B2) |
申请公布日期 |
2007.01.16 |
申请号 |
US20040890498 |
申请日期 |
2004.07.13 |
申请人 |
ANVIK CORPORATION |
发明人 |
KLOSNER MARC A.;JAIN KANTI |
分类号 |
G03B27/54;G03B27/32;G03B27/42 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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