发明名称 |
RESIN MATERIAL FOR GAS SEPARATION BASE AND PROCESS FOR PRODUCING THE SAME |
摘要 |
A resin material for gas separation bases which has a cardo-type polymer structure in which at least 0.1% of the hydrogen atoms of the pendant benzyl and/or allyl groups have been replaced by a halogen or a resin material for gas separation bases which comprises a polymer in which at least 34% of the hydrogen atoms of the pendant benzyl and/or allyl groups have been replaced by a halogen; the polymer constituting the resin material for gas separation bases which has the cardo-type polymer structure; and a process for producin g the polymer. The resin material not only is excellent in solvent solubility, easiness of film formation by a wet process, thermal stability, chemical stability, etc., but has better performances with respect to gas permeabilit y and gas selectivity. Thus, a gas separation base, especially a gas separatio n membrane, can be produced in which gas permeability and gas selectivity can be easily controlled.
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申请公布号 |
CA2367842(C) |
申请公布日期 |
2007.01.16 |
申请号 |
CA20002367842 |
申请日期 |
2000.03.22 |
申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY;SUMITOMO ELECTRIC INDUSTRIES, LTD.;RESEARCH INSTITUTE OF INNOVATIVE TECHNOLOGY FOR THE EARTH;NIPPON STEEL CORPORATION |
发明人 |
HARAYA, KENJI;MANO, HIROSHI;TACHIKI, AKIRA |
分类号 |
B01D67/00;B01D53/22;B01D71/24;B01D71/44;B01D71/52;B01D71/56;B01D71/64;B01D71/68;B01D71/82;C08G73/10;C08J5/18 |
主分类号 |
B01D67/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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