| 摘要 |
A spin processing apparatus for a substrate is provided to prevent process liquid scattered from a substrate from being reflected to a direction toward the substrate by installing a reflection unit in the inner circumferential portions of an inner cup and an outer cup such that the reflection unit reflects the process liquid scattered from the peripheral part of the substrate downward. A rotation table(11) is rotated by a rotation driving unit while a substrate is placed on the rotation table, installed in an outer cup(1). An inner cup(21) is installed in the outer cup. The inner cup can be driven vertically by a vertical driving unit between a descent position and an ascent position wherein the upper part of the inner cup is lower than the upper surface of the rotation table in the descent position and the upper part of the inner cup is higher than the substrate in the ascent position. A first reflection unit(2,6) is installed on the inner circumference of the outer cup, downward reflecting second process liquid scattered from the periphery of the substrate when the inner cup rotates the substrate in the descent position to process the substrate by the second process liquid. A second reflection unit(25) is installed on the inner circumference of the inner cup, downward reflecting the first process liquid scattered from the periphery of the substrate when the inner cup rotates the substrate in the ascent position to process the substrate by the first process liquid.
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