发明名称 |
CAPACITIVE DEVICES, ORGANIC DIELECTRIC LAMINATES, MULTILAYER STRUCTURES INCORPORATING SUCH DEVICES, AND METHODS OF MAKING THEREOF |
摘要 |
A capacitive device, an organic dielectric laminate, a multilayer structure including the device, and a method for fabricating the same are provided to minimize delay due to loop inductance by positioning dielectric compositions and films adjacent to a semiconductor device. A dielectric composition comprising a paraelectric filler and polymer is prepared. The paraelectric filler has a dielectric constant of 50 to 150. The dielectric composition is applied onto a carrier film to form a multilayer film having a dielectric layer and carrier film layer. The multilayer film is laminated on a circuitized core. The dielectric layer of the multilayer film faces the circuitized core. The carrier film layer is removed from the dielectric layer. A metallic layer is applied onto the dielectric layer. The circuitized core, the dielectric layer and the metallic layer form a planar capacitor. The planar capacitor is processed to form a multilayer structure. |
申请公布号 |
KR20070007723(A) |
申请公布日期 |
2007.01.16 |
申请号 |
KR20060064187 |
申请日期 |
2006.07.10 |
申请人 |
E.I. DU PONT DE NEMOURS AND COMPANY |
发明人 |
BANERJI SOUNAK;COX G. SIDNEY;DIETZ KARL HARTMANN |
分类号 |
H01G4/30 |
主分类号 |
H01G4/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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