INTERNAL ELECTRODE FORMATION APPARATUS FOR CERAMIC CHIP COMPONENTS

摘要

An internal electrode formation apparatus for ceramic chip components is provided to easily and uniformly form an internal electrode in mass by continuously performing a vacuum deposition process and a sputtering process. A metal target(35) is installed in a film forming chamber(30b). A transfer roll(32) is installed on both sides of a sheet transfer chamber(30a) to transfer a ceramic sheet(31). A guide roll(33) is interposed between both sides of the transfer roll to guide the ceramic sheet to a position opposite to the metal target. An energy source is installed in the film forming chamber. A shutter(36) is interposed between the ceramic sheet region and the metal target. A mask(37) is disposed between the ceramic sheet region and the shutter in the film forming chamber.