EQUIPMENTS FOR LIGHT EXPOSURE FOR LARGE SUBSTRATE

摘要

An exposure system for forming a display device and an exposure method of the same are provided to perform efficiently an exposure process by forming an accurate pattern on a large-sized substrate without using a large-sized mask. A substrate loading process is performed to load a substrate coated with a photosensitive material on a stage. A preparation process is performed to prepare an optical modulation unit including a light source. An exposure process is performed to drive the optical modulation unit and the stage, form a predetermined image on a surface of the substrate, and expose the photosensitive material. The predetermined image is formed to obtain a periodical and repetitive pattern change on the substrate by the optical modulation unit.