| 摘要 |
A radiation-sensitive resin composition which has high sensitivity and high resolution, can readily form a patterned thin film excellent in various performances including pattern shape, compression strength, rubbing resistance, and adhesion to transparent substrates, and is inhibited from emitting sublimates upon burning; a spacer formed from the composition; and a method of forming the spacer. The radiation-sensitive resin composition is characterized by comprising (A) a polymer which has carboxy and epoxy groups and in which the ratio of the weight-average molecular weight (Mw) in terms of polystyrene to the number-average molecular weight (Mn) in terms of polystyrene both measured by gel permeation chromatography, (Mw/Mn), is 1. 7 or lower, (B) a polymerizable unsaturated compound, and (C) a radiation- sensitive polymerization initiator. ® KIPO & WIPO 2007 |
