| 摘要 |
A bake apparatus is provided to improve the efficiency of a bake process by removing the difference of temperature from a substrate coated with a photoresist layer using a movable temperature control plate. A bake apparatus includes a chamber(100), a plate, a plurality of pin holes, and a temperature control plate. The plate(200) is installed in the chamber to load and heat a substrate. The plurality of pin holes(210) are formed through the plate. The plurality of pin holes are spaced apart from each other. The temperature control plate(300) is inserted into each pin hole. The temperature control plate moves up and down to control the heat transferred to the substrate from the plate.
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