| 发明名称 |
PROCESS FOR ALLOYING SEMICONDUCTORS BY USE OF RECOIL ATOMS FROM METAL FILMS IN EXTERNAL ELECTRIC FIELD |
| 摘要 |
A process for alloying semiconductors by use of recoil atoms from metal films in external electric field in the process of radiation of system metal-semiconductor by beam of accelerated ions with influence of voltage pulse on the system. Value and direction of external electric field in the process of alloying are modified, at that profile of recoil atoms concentration in semiconductor is purposely modified.
|
| 申请公布号 |
UA20263(U) |
申请公布日期 |
2007.01.15 |
| 申请号 |
UA20060008083 |
申请日期 |
2006.07.18 |
| 申请人 |
PELIKHATYI MYKOLA MYKHAILOVYCH;HETMANETS OLEH MYKHAILOVYCH |
发明人 |
PELIKHATYI MYKOLA MYKHAILOVYCH;HETMANETS OLEH MYKHAILOVYCH |
| 分类号 |
C30B30/00;C30B31/00 |
主分类号 |
C30B30/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
