METHOD FOR FORMING RECESS GATE OF SEMICONDUCTOR DEVICE,申请号KR20040115335-传众专利搜索

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发明名称	METHOD FOR FORMING RECESS GATE OF SEMICONDUCTOR DEVICE
摘要
申请公布号	KR100669557(B1)	申请公布日期	2007.01.15
申请号	KR20040115335	申请日期	2004.12.29
申请人		发明人
分类号	H01L29/78;H01L21/336	主分类号	H01L29/78
代理机构		代理人
主权项
地址

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