发明名称 |
POSITIVE RESIST COMPOSITION AND PROCESS FOR THE FORMATION OF RESIST PATTERNS |
摘要 |
<p>A positive resist composition comprising (A) a resin component and (B) an acid generator component, wherein the resin component (A) is a copolymer comprising structural units (a1) derived from an (alpha-lower alkyl)acrylic ester having an acid -dissociable dissolution-inhibiting group containing a mono- or poly-cyclic group, structural units (a2) derived from an (alpha-lower alkyl)acrylic ester having a lactone ring, structural units (a3) derived from an (alpha-lower alkyl)acrylic ester having a polycyclic group containing a polar group, and structural units (a4) represented by the general formula (1). ® KIPO & WIPO 2007</p> |
申请公布号 |
KR20070007142(A) |
申请公布日期 |
2007.01.12 |
申请号 |
KR20067021349 |
申请日期 |
2006.10.13 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
SHIMIZU HIROAKI;IWAI TAKESHI |
分类号 |
G03F7/039;C08F220/10;C08F220/18;C08F220/28;G03F7/004;G03F7/033;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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