| 摘要 |
<p>Soluble parts of a work surface of substrate or base material that can be dissolved in a dissolving liquid are dissolved by a dissolving liquid consisting of a developer or etchant so as to carry out development or etching, thereby accomplishing formation of a high-resolution pattern by such an engraving. There is provided a method of forming a high-resolution pattern, involving development or etching, wherein in the step of forming a pattern on a work surface of substrate or base material that can be dissolved in a dissolving liquid, a dissolving liquid highly pressurized in advance and a high-pressure air are introduced in a nozzle and, from the nozzle, a mixed fluid of the high-pressure air and dissolving liquid is sprayed to thereby dissolve the soluble parts.</p> |
