发明名称 PLASMA TREATMENT APPARATUS AND PLASMA TREATMENT METHOD
摘要 <p>A stress applied to a slot board and a dielectric for generating surface plasma is reduced by depressurizing inside a vacuum waveguide tube for propagating microwaves to high vacuum, preventing abnormal discharge in the vacuum waveguide tube and the slot board, and by reducing a pressure difference between a pressure inside the treatment chamber and that inside the vacuum waveguide tube. Thus, high quality plasma treatment is performed.</p>
申请公布号 WO2007004576(A1) 申请公布日期 2007.01.11
申请号 WO2006JP313123 申请日期 2006.06.30
申请人 ADVANCED LCD TECHNOLOGIES DEVELOPMENT CENTER CO.,LTD.;SUGAI, HIDEO;IDE, TETSUYA;SASAKI, ATSUSHI;AZUMA, KAZUFUMI 发明人 SUGAI, HIDEO;IDE, TETSUYA;SASAKI, ATSUSHI;AZUMA, KAZUFUMI
分类号 H05H1/46;C23C16/511;H01L21/3065 主分类号 H05H1/46
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