发明名称 Ophthalmic observation apparatus
摘要 An apparatus for observing an eye of an examinee by imaging the eye, comprises: an irradiation optical system including a laser source which emits a laser beam and a scanning unit which two-dimensionally scans the beam onto an objective part of the examinee's eye to be observed, the irradiation optical system being adapted to irradiate the beam to the objective part; an imaging optical system including a photo-receiving element which receives the beam reflected by the objective part; a monitor; and a display control part which produces an image of the objective part based on an output signal from the photo-receiving element, and causes the monitor to display the image; wherein the imaging optical system includes a wavefront detector which receives the beam reflected by the objective part to detect wavefront aberration thereof and a wavefront compensator adapted to compensate the wavefront aberration based on a detection result of the wavefront detector, the wavefront compensator being placed within an optical path of the imaging optical system excepting a common optical path with the irradiation optical system.
申请公布号 US2007010313(A1) 申请公布日期 2007.01.11
申请号 US20060473125 申请日期 2006.06.23
申请人 NIDEK CO., LTD. 发明人 AKITA JUNICHI
分类号 A63F9/24 主分类号 A63F9/24
代理机构 代理人
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