| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processor which prevents pattern defects from being caused with a liquid infiltrated into a substrate or a film on the substrate at exposing. SOLUTION: The substrate processor 500 includes an indexer block 9, antireflective film processing block 10, resist film processing block 11, developing processing block 12, resist cover film processing block 13, resist cover film removing block 14, cleaning/drying processing block 15, and interface block 16. These blocks are disposed in this order in the processor 500. An aligner 17 is disposed adjacently to the interface block 16 of the substrate processor 500. A hydrophobic processing unit HYP is disposed in the resist cover film processor 13 to apply a hydrophobic process to the substrate W before the exposure process. COPYRIGHT: (C)2007,JPO&INPIT |
