发明名称 |
Phase change memory with adjustable resistance ratio and fabricating method thereof |
摘要 |
A phase change memory with adjustable resistance ratio is disclosed, which includes a phase change layer and an interfacial layer formed to be in contact with each other, and at least two electrodes in contact with the phase change layer and the interfacial layer respectively. The contact sections between the two electrodes and the phase change layer and the interfacial layer define a contact area respectively, wherein, the area defined by the contact section between the electrode and the phase change layer is larger than the area defined by the contact section between the electrode and the interfacial layer.
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申请公布号 |
US2007007613(A1) |
申请公布日期 |
2007.01.11 |
申请号 |
US20050240449 |
申请日期 |
2005.10.03 |
申请人 |
WANG WEN-HAN;LIANG JIUH-MING;YEH JYI-TYAN;CHIOU SHAN-HAW |
发明人 |
WANG WEN-HAN;LIANG JIUH-MING;YEH JYI-TYAN;CHIOU SHAN-HAW |
分类号 |
H01L31/058;G11C11/00;H01L29/02;H01L29/06;H01L47/00 |
主分类号 |
H01L31/058 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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