发明名称 RADIATION-SENSITIVE RESIN COMPOSITION FOR HOLOGRAM, RADIATION-SENSITIVE DRY FILM FOR HOLOGRAM, METHOD FOR FORMING HOLOGRAM, AND RECORDING MEDIUM FOR HOLOGRAM
摘要 <P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition for hologram recording, the composition giving reproduced light with high reproducibility in a simple process, and resulting in wide selectivity of angles and high diffraction efficiency, and to provide a recording medium made of the radiation-sensitive resin composition for hologram recording having the above excellent characteristics. <P>SOLUTION: The radiation-sensitive resin composition for a hologram contains [A] liquid crystal molecules, [B] a polymerizable compound having two or more ethylenically unsaturated bonds, [C] a photopolymerization initiator, and [D] a reactive diluent. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007003772(A) 申请公布日期 2007.01.11
申请号 JP20050183178 申请日期 2005.06.23
申请人 JSR CORP 发明人 KAWAKAMI YUSUKE;CHO YEONG HEE
分类号 G03H1/02;G03F7/004 主分类号 G03H1/02
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