| 摘要 |
A method for fabricating an electrode assembly for generating ions for use in a plasma etching is provided to secure strong coupling state between a ring and an electrode plate by coupling the ring and the electrode plate by means of a physical manner. A plurality of coupling grooves(21) are formed along an outer circumference of a ring(20) at regular intervals. The coupling grooves are cut to be matched to a shape of a coil(30). The coil is inserted into a cooling chamber that utilizes liquid nitrogen or helium as a coolant. The inserted coil is cooled to have an outer diameter that is not touched to an inner wall of the respective coupling grooves. The cooled coil is inserted into the coupling grooves. An electrode plate(40) provided with a through hole is coupled to the ring through a screw that is inserted into the coupling grooves.
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