发明名称 IN-LINE SPUTTERING SYSTEM
摘要 An in-line sputtering system is provided to reduce the installation cost of the equipment by integrally installing the direction conversion and processing chambers and to minimize occurrence of the impurity particles by moving the transfer apparatus during the process. An in-line sputtering system is composed of inlet/outlet load lock chambers(130,140) operating the conversion of the atmospheric pressure and the vacuum to load and unload the base plate; buffer heating/cooling chambers(150,160) contacted with the inlet/outlet load lock chambers to heat and cool the base plate; and a direction conversion/processing chamber(170) contacted with the buffer heating/cooling chambers and arranged with a direction conversion unit(174) for direction-conversing sputtering sources(172) for coating the thin film at the base plate and the base plate. The sputtering sources are arranged at both sides in the direction conversion/processing chamber.
申请公布号 KR100667886(B1) 申请公布日期 2007.01.11
申请号 KR20050059251 申请日期 2005.07.01
申请人 SFA ENGINEERING CORP. 发明人 YOO, WUN JONG;LEE, SANG MUN;KIM, NAM JIN;KWAK, IL SOON
分类号 C23C14/34 主分类号 C23C14/34
代理机构 代理人
主权项
地址