| 摘要 |
PROBLEM TO BE SOLVED: To provide a new, soluble polyhedral silsesquioxane excellent in the heat resistance and low dielectric; a curable resin composition capable of forming such a protective membrane for use in optical devices by a membrane formed from the said polyhedral silsesquioxane as satisfies the necessary transparency, heat resistance, surface hardness and adhesiveness and as is excellent in the reworkability and excellent in the performance of flattening the level difference of color filters formed on the foundation substrate; a protective membrane formed from the said composition; and a method for forming the protective membrane. SOLUTION: The polyhedral organosilsesquioxane is expressed by formula (1) (wherein, RPh group is a phenyl group substituted with R; and R is a 1-20C alkyl group or an oligosiloxanyl group such as an oligodimethyl siloxanyl group). The membrane is obtained from this compound. COPYRIGHT: (C)2007,JPO&INPIT
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