| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide lithography equipment and a method for manufacturing device. <P>SOLUTION: The lithography equipment comprises at least one of support structures MT, constructed so as to support a pattern forming device MA capable of giving a pattern to the section of a radiation beam on which a pattern-formed beam is formed, and a substrate table MT constructed so as to hold a substrate MA. At least either of the support structure MT or the substrate table MT comprises a contact surface that comes into contact with the pattern-forming device MA and the substrate MA, respectively. The contact surface comprises a plurality of sub contact surfaces 20 for increasing mutual adhesion, at least between the support structure and the pattern-forming device, or between the substrate table and the substrate. <P>COPYRIGHT: (C)2007,JPO&INPIT |
