发明名称 PROCESSING METHOD, DISPLAY DEVICE, AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method which can stably restore conductive films such as interconnect lines in semiconductor devices such as display devices. SOLUTION: The processing is carried out by a joint process in which a first and a second conductive film 10 and 11 separated mutually among a large number of conductive films prepared on a substrate 3 are respectively jointed with a third conductive film 14 by adhesion of a first and a second connecting member 12 and 13, and by an elimination process which eliminates at least a part of the third conductive film leaving a coupling member 15 from the first connecting member 12 down to the second connecting member 13. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007005706(A) 申请公布日期 2007.01.11
申请号 JP20050186723 申请日期 2005.06.27
申请人 SONY CORP 发明人 KOSHIISHI AKIRA;NADA NAOJI;KAWABE HIDEO
分类号 H01L21/3205;G09F9/30;H01L23/52;H01L29/786 主分类号 H01L21/3205
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