| 摘要 |
Methods are disclosed for the layout and manufacture of microelectronic circuits. The methods employ the monitoring of the placement of macros within circuit layouts for design rule compliance. Upon detection of noncompliance, the macros associated with noncompliance are adapted to bring the layout within the design rules. In a preferred embodiment of the invention monitoring the relative positions of macros includes identifying instances of coinciding macro (x, y) coordinates. Adapting noncompliant macros further includes steps for maintaining minimum (x, y) distances between adjacent macro corners.
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