| 摘要 |
<p>A reticle handler of an exposing apparatus is provided to prevent repeated defects formed on a wafer due to pollutants adhered to a reticle by forming a reticle cleaning apparatus for cleaning the reticle on the reticle handler. A reticle is stored in libraries(1,2,3). The reticle is distinguished from and selected in index regions(1,2,3). A reticle cleaning apparatus(56) cleans the selected reticle before it is arranged on an exposing position. The reticle is arranged on the exposing position of a reticle table(58). The reticle cleaning apparatus includes a reticle support, an air shower, and an exhaust hole. The reticle is placed on the reticle support. The air shower blows off air on a surface of the reticle to remove dusts. The air is exhausted through the exhaust hole.</p> |
